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单词 pulsed ion source
释义
pulsed ion source
  • 简明释义
  • 脉冲离子源
  • 网络释义
  • 1

    ?脉冲离子源

    ... 封闭式离子源 tight ion source 脉冲离子源 pulsed ion source 栅极离子源 RF ; DC ...

短语
  • 双语例句
  • 1
    The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
    等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
  • 2
    The invention relates to an ion implanter (imp) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate.
    本发明涉及离子注入机imp,包括脉冲等离子体源spl、衬底支承台PPS和所述台的电源alt。
  • 3
    The pulsed GD ion source has the characters of high ion production and working stability. It is suitable for direct analysis of metal in alloy.
    其中,辉光放电离子源具有离子产额高、工作稳定可靠等特点,可用于对金属(合金)样品的直接分析。
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更新时间:2025/3/30 13:21:34