The invention provides a polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishingmedium with a polishing pad.
本发明提供一种抛光垫，在抛光垫具有抛光媒质的情况下，用于抛光磁的、光学的和半导体衬底中至少一种。
2
At present, the most widely used for stainless steel kitchenware, lamps, motorcycle parts, auto parts and other fine polishingmedium hardness of materials, but also for free grinding.
Recommended Applications: Resin bonded grinding wheels, electroplated products; grinding and polishing optical glass, ceramics and medium toughness stone, etc.