Low voltage high current reactiveionplating is a new progress in the field of optical thin films deposition techniques.
光学薄膜低压大电流反应离子镀技术是近年来光学薄膜技术领域中的最新进展。
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ABSTRACT: in this paper a reactiveionplating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
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High quality ITO transparent conductive film was prepared by reactive low voltage ionplating technique, which is different to the most common sputtering method to deposit ITO film.