Low voltage high current reactiveion plating is a new progress in the field of optical thin films deposition techniques.
光学薄膜低压大电流反应离子镀技术是近年来光学薄膜技术领域中的最新进展。
2
This accelerometer is fabricated by N type silicon wafer. To obtain high aspect ratio structure, deep reactiveion etching(DRIE) process is employed.
加速度计用普通的N型硅片制造,为了刻蚀高深宽比的结构,使用了深反应离子刻蚀(DRIE)工艺。
3
The gated silicon field emitter arrays (FEA) with small gate aperture have been successfully fabricated by dry etching, including ion beam etching (IBE) and reactiveion etching (RIE).