The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
2
The influence of negative pulse voltage applied directly to stainless steel samples on plasma characteristics has been found to be negligible, except sample sputtering.
直接施加于试样的脉冲负偏压对等离子体特性没有明显影响，但存在着一定的溅射作用。
3
Mercury used as a cathode sputtering inhibitor in DC plasma displays with a content up to 30 mg per display until 1 July 2010.