The HL-2A plasma boundary has been identified using a filament current method with the magnetic signals obtained outside the plasma.
利用等离子体外部测量的磁场信号，使用丝电流方法对HL 2a等离子体边界进行了快速识别。
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To further increase deposition rates, the filament array is biased negatively with respect to the substrate holder so that a DC plasma is also maintained between the substrate and filament array.