The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasmachemical vapor deposition process was discussed.
Finally, annealing process is carried out in the electroplated metal layer formed by the electroplating process through chemical vapor deposition method under promotion of ammonia plasma.
之后，利用氨气等离子体促进化学气相沉积法对上述经电镀制程而形成的电镀金属层进行退火处理。
3
The hydrogen and boron ion bombardments were performed by applying a negative bias voltage to the substrate during microwave plasmachemical vapor deposition process.