Direct current hot cathodeplasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
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The main purpose of this paper is to introduce the structure and functions of plasma powder surfacing gun with cathode powder feeding.