物理气相沉积是多种溅射 技术的通称, 它包括射频溅射 ( radio frequency sputtering) 、直流反应磁控溅射 ( reactively direct current magnetron sputtering , RDCMS) 和粒子束增强沉 积(ion2beam2assisted deposi...
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?射频溅镀
射频溅镀(Radio Frequency Sputtering) 是一种高频的交流电源， 当靶材接上 RF 进而引发电浆时，会在靶材的表面形成负偏压，进而
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?射频溅射法
?溅射法依不同能源，可分射频溅射法(radio frequency sputtering)及 直流磁控溅射法 ( DC magnetron sputtering )。 ?利用射频溅射技术可获得稀土金属氟化合物(REMF)-MoS 2 -Au 多 层奈米薄膜。
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?频溅镀法
? 导电性的靶材是使用直流式溅镀法 ? 半导体、绝缘体的成膜则使用高频的射 频溅镀法(Radio Frequency Sputtering ， RF) 。
HfOxNy thin films were deposited by radiofrequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
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ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.