Plasma chemical vapor deposition in silane radiofrequencyglowdischarge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
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It proposes a way to obtain atmospheric radiofrequencyglowdischarge with high stability and reduced power consumption by operating discharge in ignition phase.