Firstly, it was contrastively studied that the nanometer carbon black was oxidized by two kind of oxygen plasma: radiofrequencydischarge (RF) and dielectric barrier discharge (DBD).
Modification effect of hot filament gas discharge PIII was compared with that of radio-frequency (RF) glow discharge PIII.
分析比较了灯丝放电PIII和射频辉光放电PIII对基体表面进行氮离子注入后的改性效果。
3
Plasma chemical vapor deposition in silane radiofrequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.