The principle and control algorithm of temperature compensation for Sub Micron projectionlithography objectives are introduced.
主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
2
The large field projectionlithography lens is a special optical lenses form, which put an high demands on the design and processing both for mechanical and optical.
大视场投影光刻物镜是光学系统中的一种特殊的形式，其设计加工要求高。
3
The calculative method of the large field projectionlithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.