A novel in-situ non-flatness measurement method of wafer stage mirrors in a step-and scan lithographic tool is presented.
提出一种新的步进扫描投影光刻机工件台方镜不平度测量方法。
2
Its very difficult to achieve the flatness detection of the large flat surface formed with several non-continuous vertical planes with traditional contact measurement.
传统的接触式测量方法很难实现由多个非连续铅垂面形成大平面的平面度的检测。
3
Products for non-brittle material, toughness, high strength, good flatness, size regular, machining performance and the construction can be cut to facilitate bending.