The laser direct writing(LDW) system SVGLDW 04 with a projection optical system and a spatial light modulator(LCD-SLM) can expose a reduction pattern directly on a photoresist plate.
The SU-8 photoresist was performed energy minimization and MD simulation time after time until the system achieved equilibrium completely. And the elastic constants were analysed with analysis tool.
The positive photoresist composition which is suitable for used in a resist coating method by a discharge nozzle system can be provided according to the invention.