According to the analysis of the photoresistprocess that got organic initiator conditions, nanometer of physical map was obtained.
根据对有机引发剂条件下的光刻胶过程的分析得出了纳米级实体图。
2
The process of SU-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.
初步研究了SU-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。
3
We developed a non silicon surface micro machining process with two or three mask electroplating layers and using polyimide or photoresist as sacrificial layers.