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单词 photolithography mask layer
释义
photolithography mask layer
  • 简明释义
  • 光刻遮罩层
  • 网络释义
  • 1

    ?光刻遮罩层

    ... 反遮罩锐化 unsharmask 光刻遮罩层 photolithographic mask layer; photolithography mask layer 绘制遮罩 draw mask ...

  • 双语例句
  • 1
    For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
    针对纳米压印光刻技术中压印脱模后的留膜去除问题,提出了一种基于光刻版的无留膜紫外纳米压印技术。
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更新时间:2025/3/26 17:07:57