In this paper, the aberration theory of electron image forming systems in the combined focusing and deflecting field has been researched using the technology of numerical simulation.
本文利用数值仿真技术对复合场中电子成像系统的像差理论做了研究。
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In high numerical aperture and low technic factor lithography process, degradation of the image quality because of the coma aberration in the projection lens has become a serious problem.
We considered intensity distribution of light focused by a high numerical aperture lens without spherical aberration through a planar interface between materials of mismatch refractive index.