The calculative method of the large field projection lithography lens is presented, and on the distortion measuringsetup which is accomplished, distortion measurement of 8 inch wafer is completed.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
2
When measuring the leakage current with this setup, the voltage bias is applied to all the diodes simultaneously through the normally closed contact of each relay.
当利用这一配置测量漏流时，通过每个继电器的常闭触点同时向所有的二极管施加偏压。
3
This article main discuss the measuring the micro-displacement of the object, and we design a new setup to measuring the displacement and the titling factor in one time .