The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
An in situ residual gas analyzer (RGA) was used to monitor the residual gas composition in the vacuum chamber.
利用残余气体分析仪在线监测了真空室内的残余气氛组成。
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Finally a hypodermic type probe was inserted in to the base of the coffee bean hopper to monitor the temperature of the beans prior to entering the grinding chamber.