The right-truncated cone is firstly adopted to approximate metallic wire target with a curvilinear axis and variable radius.
首先引入直截锥体单元来模拟金属线状目标，可对横截面连续变化的导线做精确近似；
2
The causes of metallic state sputtering with Mg target are analyzed.
以镁靶为例，分析了出现金属态沉积的原因。
3
During deposition process, the temperature of target increases for the bad cooling condition which increase the sputtering rate, so the metallic state sputtering is formed.