Essay brief a few kind methods of correcting distortion of Scan Projection MaskAlignment System.
介绍了调整扫描投影式光刻机畸变的几种方法。
2
Furthermore, a stepwise approach with varying step lengths, and a compensation strategy following the manipulator's rotation are introduced in the IC maskalignment.
对准控制采用阶梯步长逐步逼近算法，并且引入了机械手姿态调整后的补偿控制，以提高对准效率。
3
LIGA mask technology based on silicon process technique and double side alignment is presented. The processing technology is simple.