Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapordeposition at lowtemperature.
以镍片为基板材料,利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜。
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Plasma enhanced chemical vapordeposition (PECVD) is one of the matured and simple manipulated among the thin film deposition methods at lowtemperature.