英语词汇low-temperature annealing怎么读，是什么意思，单词翻译、读音、固定搭配用法和短语词组及例句-英汉双解词典

单词

low-temperature annealing

释义

low-temperature annealing

简明释义

低温退火

网络释义

1
?低温退火
... 等温退火 ausannealing; isostatic annealing; isothermal a ealing; isothermal annealing 低温退火 low temperature a ealing; low temperature annealing; low-temperature annealing; negative hardening; o annealing; process annealing; stress relieving 低温退火炉 stress relieving annealing furnace ...

短语

1
low temperature annealing
分散退火
2
low temperature annealing treatment
低温退火处理
3
low temperature annealing hardening
低温退火硬化

双语例句

1
There are precipitation strengthening effect during nature aging and low-temperature annealing, however, the conductivity remains stable basically.
材料在自然时效与低温退火过程中，有沉淀强化效应产生，但导电率基本保持稳定。
2
Relatively low ordering temperature for the multilayer is due to the extra driving force of ordering process caused by the vanishing of the multilayer interface at annealing.
多层膜化促进有序化在较低的温度下进行，这是由于热处理过程中多层膜界面的消失提供了有序化过程额外的驱动力。
3
Thecomplete annealing temperature of the defects for low fluence irradiated GaP was250K lower than that for high fluence irradiated GaP.
而高住量辐照样品中观察到比双空位更复杂的缺陷形式，其完全被退火的温度比低剂量辐照的高250k。

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单词	low-temperature annealing
释义	low-temperature annealing 简明释义低温退火网络释义 1 ?低温退火 ... 等温退火 ausannealing; isostatic annealing; isothermal a ealing; isothermal annealing 低温退火 low temperature a ealing; low temperature annealing; low-temperature annealing; negative hardening; o annealing; process annealing; stress relieving 低温退火炉 stress relieving annealing furnace ... 短语 1 low temperature annealing 分散退火 2 low temperature annealing treatment 低温退火处理 3 low temperature annealing hardening 低温退火硬化双语例句 1 There are precipitation strengthening effect during nature aging and low-temperature annealing, however, the conductivity remains stable basically. 材料在自然时效与低温退火过程中，有沉淀强化效应产生，但导电率基本保持稳定。 2 Relatively low ordering temperature for the multilayer is due to the extra driving force of ordering process caused by the vanishing of the multilayer interface at annealing. 多层膜化促进有序化在较低的温度下进行，这是由于热处理过程中多层膜界面的消失提供了有序化过程额外的驱动力。 3 Thecomplete annealing temperature of the defects for low fluence irradiated GaP was250K lower than that for high fluence irradiated GaP. 而高住量辐照样品中观察到比双空位更复杂的缺陷形式，其完全被退火的温度比低剂量辐照的高250k。
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