Wash the wafers with mixed acid, lotion and UPW (ultra pure water) by ultrasonic cleaning in wet sinks to get a clean and dry surface of wafers.
用混合酸、清洗剂和纯水在清洗槽或超声波清洗机内清洗硅片，使其表面洁净并烘干。
2
Apply lotion and wash it away after 20 minutes 'massage.
洁面后取适量，按摩20分钟后用清水洗净。
3
The clothes into the dry distillation, solvent in the water and detergent with both hands (wear gloves) rub is kneaded, silica gel wash clothings reoccupy after washing clean dry lotion.