Arc ionplating or magnetron sputtering provides the best application condition for pulse technique.
电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。
2
ABSTRACT the application of pulse technique on arc ionplating and magnetron sputtering is summarized in the article.
摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
3
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ionplating deposition technique, belonging to the film making field.