The invention relates to a device for improving utilization rate of a high vacuum ionbeamsputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
2
The newly designed films of green HeNe laser have been coated by making use of ionbeamsputtering deposition, and the measured results have been given out.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
3
It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ionbeamsputtering on graphite target.