It can be used for single ion implantation, ionbeam mixing, single ion or reactive ionbeam sputter-deposition and ionbeamenhanceddeposition.
可用于单离子注入,离子束混合,单离子或反应离子束溅射淀积以及离子束增强淀积。
2
DLC films and gradient composition DLC films were deposited on si substrates in plasma-ionbeamenhanceddeposition system for the industrial applications and improving the adhesion.