The simulation and experiment have shown that the pattern may restrain remarkably impuritysegregation effect in the process of PMOS structure grid oxidization.
模拟及实验证实，该模式可显著抑制PMOS结构栅氧化过程中的杂质分凝。
2
The results show that high content of impurity elements, segregation along grain boundaries and uneven grain size are main reasons for the surface damage of domestic tungsten targets.
结果显示，杂质元素的含量偏高和沿晶界的偏析以及不均匀的钨晶粒是造成国产钨靶表面损伤的主要原因。
3
The induced electromagnetic field possesses the action of electromagnetic purification, and effectively removes formation of impurity grain, segregation, negative segregation and gas cavity.