The study of this dissertation analyses the focus system technology, which is the key technology of curve plane surface lithographic fabrication techniques.
本文重点讨论了曲面光刻的关键技术——自动调焦系统，并对曲面工艺及光刻线条进行实验分析。
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Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.