In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laserinduced chemical vapor deposition), and introduced the designing thought of key parts.
It is used in many areas. In this paper, the general principles of LICVD (laserinduced chemical vapor deposition) were investigated and the measures to reduce dissociated si were put forward.
The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.