The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-inducedchemicalvapordeposition (LCVD) are simply introduce.
In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laserinducedchemicalvapordeposition), and introduced the designing thought of key parts.
It is used in many areas. In this paper, the general principles of LICVD (laserinducedchemicalvapordeposition) were investigated and the measures to reduce dissociated si were put forward.