The improvements are most likely due to the reduction of the gateleakagecurrent and the charge injection effect.
这些效能改进的原因可以归之于经过表面处理后,闸极漏电流的降低以及载子注入的减少。
2
However, when oxide thickness increased to a fixed value at a specific oxide field, the increase in gateleakagecurrent caused by a single oxygen vacancy could be neglected.
但当厚度在特定值及特定电场下时,单个氧空位引起的栅漏电流增加可以忽略。
3
Various MOSFET tests require making low current measurements. Some of these tests include gateleakage, leakage current vs. temperature, substrate to-drain leakage, and sub-threshold current.