It is found that the sputtering yield of kinetic impact is increased by HCIs and the potential sputtering (PS) could be induced by impact of HCIs.
实验结果表明高电荷态离子能够增加动能溅射;同时高电荷态离子入射能够引起势能溅射。
2
It is found that the sputtering yield of kinetic impaction is increased by HCIs and the potential sputtering (PS) could be induced by impaction of HCIs.