The iron concentration in the superficial layer of oxidized wafers after RTA decreases as a result of the homogenizationeffect of RTA.
由于RTA的均匀化作用,氧化硅片表层的铁浓度显著低于氧化刚结束时硅片表层的铁浓度。
2
The results show that different homogenization methods have no effect on the microstructure except the particle size and morphologies of PbS nanoparticles.
结果表明:不同均化手段对产物的结构并不产生影响,但影响产物的粒径、形貌和分散性等。
3
The results show that different homogenization methods make no effect on the microstructure except the particle size and micrograph.