Cathode temperature is one of the most important factors influencing the stability of high currentglowdischarge.
阴极的温度是影响大电流辉光放电稳定工作的重要因素。
2
Large current hot cathode glowdischarge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
3
Direct current hot cathode plasma glowdischarge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.