The electronbeam local heat treatment (EBLHT) is a newly heat treatment that provides the advantages of high precision, flexility and efficiency, energy source saving and productivity improving.
Useing high energy electronbeam as pumping source to excite semiconductor crystal screen laser could be generated. It can realize high brightness and high resolution display.
用高能电子束作泵浦源，去激励半导体晶体屏，可以产生激光，实现高亮度高清晰显示。
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The electronbeam ion trap(EBIT) and the electron ion source(EBIS) are new instruments for the study of X-ray produced by very highly-charged ions when they interact with free electrons.