The projectionelectronbeam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
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Mask fabrication is a key technique of scattering with angular limitation projectionelectron-beam lithography (SCALPEL).