Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
2
The fabrication methods of MPC include electronbeam lithography with subsequent evaporation and lift-off, interference lithography with dry-etching technology etc.
制备金属光子晶体方法包括:电子束刻蚀结合后续剥离法、激光干涉光刻结合干刻蚀技术等。
3
DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.