The elementary exposure pattern of a variable rectangular electronbeamexposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
2
A new type high accuracy high voltage D. C. power supply used for electronbeamexposure sysfem is described.
本文介绍一种电子束曝光机用新型精密高压电源。
3
In this paper, the principle of electronbeam write wafer is discussed briefly distinguish topography mark, and make the technology of wafer mark which is found by the electronbeamexposure system.