Food is irradiated by brief exposure to X-rays, gamma rays or an electronbeam.
食品通过短暂地暴露在x射线、γ射线或电子束来进行辐照杀菌。
2
The present results not only can help to optimize the exposure conditions in ElectronBeam Lithography, but also supply more accurate data for proximity effect correction.
In this paper, the principle of electronbeam write wafer is discussed briefly distinguish topography mark, and make the technology of wafer mark which is found by the electronbeamexposure system.