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单词 photoresist
释义

Definition of photoresist in English:

photoresist

noun ˌfəʊtəʊrɪˈzɪstˌfōdōrəˈzist
  • A photosensitive resist which, when exposed to light, loses its resistance or its susceptibility to attack by an etchant or solvent. Such materials are used in making microcircuits.

    光阻材料,光致抗蚀剂

    Example sentencesExamples
    • When exposed to light, the photoresist undergoes a chemical change that alters its solubility in a certain solvent.
    • The mask creates an interference pattern, exposing the photoresist in certain areas and leaving it unaffected in others.
    • The researchers recorded the image onto a photoresist, a polymer coating on the other side of the superlens that becomes insoluble when exposed to UV light.
    • The gold layers are structured by means of a process called photolithography, whereby light sensitive polymer resins or photoresists serve as masking material for the transfer of images onto the underlying substrate.
    • An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed.

Definition of photoresist in US English:

photoresist

nounˌfōdōrəˈzist
  • A photosensitive resist which, when exposed to light, loses its resistance or its susceptibility to attack by an etchant or solvent. Such materials are used in making microcircuits.

    光阻材料,光致抗蚀剂

    Example sentencesExamples
    • When exposed to light, the photoresist undergoes a chemical change that alters its solubility in a certain solvent.
    • The researchers recorded the image onto a photoresist, a polymer coating on the other side of the superlens that becomes insoluble when exposed to UV light.
    • An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed.
    • The gold layers are structured by means of a process called photolithography, whereby light sensitive polymer resins or photoresists serve as masking material for the transfer of images onto the underlying substrate.
    • The mask creates an interference pattern, exposing the photoresist in certain areas and leaving it unaffected in others.
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更新时间:2024/11/8 21:07:02